US Patent Issued to Lam Research on March 11 for "Carbon based depositions used for critical dimension control during high aspect ratio feature etches and for forming protective layers" (Oregon, California Inventors)

Posted On: 2025-03-12

ALEXANDRIA, Va., March 12 -- United States Patent no. 12,249,514, issued on March 11, was assigned to Lam Research Corp. (Fremont, Calif.).

"Carbon based depositions used for critical dimension control during high aspect ratio feature etches and for forming protective layers" was invented by Jon Henri (West Linn, Ore.), Karthik S. Colinjivadi (Dublin, Calif.), Francis Sloan Roberts (Portland, Ore.), Kapu Sirish Reddy (Portland, Ore.), Samantha Siamhwa Tan (Fremont, Calif.), Shih-Ked Lee (Fremont, Calif.), Eric Hudson (Berkeley, Calif.), Todd Shroeder (Sherwood, Ore.), Jialing Yang (Sherwood, Ore.) and Huifeng Zheng (Beaverton, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Fabricating a semiconductor su...

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US Patent Issued to Lam Research on March 11 for "Carbon based depositions used for critical dimension control during high aspect ratio feature etches and for forming protective layers" (Oregon, California Inventors)