ALEXANDRIA, Va., June 4 -- United States Patent no. 12,322,571, issued on June 3, was assigned to Lam Research Corp. (Fremont, Calif.).

"Multi-state RF pulsing to control mask shape and breaking selectivity versus process margin trade-off" was invented by Nikhil Dole (Union City, Calif.), Vikhram Vilasur Swaminathan (Redwood City, Ore.), Beibei Jiang (Fremont, Calif.) and Merrett Wong (San Carlos, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for performing an etch process on a substrate in a plasma processing system, including: applying source RF power and bias RF power to an electrode; wherein the source RF power and the bias RF power are pulsed signals that together define a plurality of ...