US Patent Issued to Lam Research on June 3 for "Metal contamination reduction in substrate processing systems with transformer coupled plasma" (California Inventors)

ALEXANDRIA, Va., June 4 -- United States Patent no. 12,322,579, issued on June 3, was assigned to Lam Research Corp. (Fremont, Calif.).

"Metal contamination reduction in substrate processing systems with transformer coupled plasma" was invented by Maolin Long (Santa Clara, Calif.), Neema Rastgar (San Jose, Calif.) and Alexander Miller Paterson (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing system includes a processing chamber including a substrate support to support a substrate. A coil includes at least one terminal. An RF source configured to supply RF power to the coil. A dielectric window is arranged on one surface of the processing chamber adjacent to the coil. A ...