US Patent Issued to LAM RESEARCH on July 1 for "Substrate processing system including dual ion filter for downstream plasma" (California Inventors)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,347,650, issued on July 1, was assigned to LAM RESEARCH Corp. (Fremont, Calif.).

"Substrate processing system including dual ion filter for downstream plasma" was invented by Andrew Stratton Bravo (Piedmont, Calif.), Chih-Hsun Hsu (Cupertino, Calif.), Serge Kosche (San Francisco), Stephen Whitten (Danville, Calif.), Shih-Chung Kon (Fremont, Calif.), Mark Kawaguchi (San Carlos, Calif.), Himanshu Chokshi (Fremont, Calif.), Dan Zhang (Fremont, Calif.) and Gnanamani Amburose (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A dual ion filter is arranged between upper and lower chambers of a substrate processing system. The dual ion filter inclu...