US Patent Issued to LAM RESEARCH on Jan. 28 for "Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead" (California Inventors)

ALEXANDRIA, Va., Jan. 29 -- United States Patent no. 12,211,709, issued on Jan. 28, was assigned to LAM RESEARCH Corp. (Fremont, Calif.).

"Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead" was invented by Dengliang Yang (Union City, Calif.), Haoquan Fang (Sunnyvale, Calif.), David Cheung (Foster City, Calif.), Gnanamani Amburose (Fremont, Calif.), Eunsuk Ko (San Jose, Calif.), Weiyi Luo (Fremont, Calif.) and Dan Zhang (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Several designs of a gas distribution device for a substrate processing system are provided. The gas distribution device includes a dual plenum showerhead. Additionally, des...