US Patent Issued to Lam Research on Jan. 20 for "Low temperature plasma enhanced chemical vapor deposition process including preheated showerhead" (Oregon Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,531,208, issued on Jan. 20, was assigned to Lam Research Corp. (Fremont, Calif.).

"Low temperature plasma enhanced chemical vapor deposition process including preheated showerhead" was invented by Boyi Hao (Tigard, Ore.), Joseph Wei (Portland, Ore.), Chengzhu Qi (Lake Oswego, Ore.), Pragati Kumar (Sherwood, Ore.) and Sardar Sardari (Beaverton, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma enhanced chemical vapor deposition processing method is provided and includes: preheating a showerhead to a preheated state prior to and in preparation of a plasma enhanced chemical vapor deposition process of a substrate; determining at least one temper...