US Patent Issued to Lam Research on Jan. 13 for "Plasma uniformity control using a pulsed magnetic field" (California Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,525,458, issued on Jan. 13, was assigned to Lam Research Corp. (Fremont, Calif.).

"Plasma uniformity control using a pulsed magnetic field" was invented by Alexei Marakhtanov (Albany, Calif.), Bing Ji (Pleasanton, Calif.), Ken Lucchesi (Newark, Calif.) and John Holland (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "In some implementations, a method for performing a plasma process in a chamber is provided, including: supplying a process gas to the chamber; applying pulsed RF power to the process gas in the chamber, the pulsed RF power being provided at a predefined frequency, wherein the applying of the pulsed RF power to the process ga...