US Patent Issued to LAM RESEARCH on Jan. 13 for "DC bias circuit and gas delivery system for substrate processing systems" (Oregon, Washington Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,522,927, issued on Jan. 13, was assigned to LAM RESEARCH Corp. (Fremont, Calif.).

"DC bias circuit and gas delivery system for substrate processing systems" was invented by Arul Dhas (Sherwood, Ore.), Kareem Boumatar (Vancouver, Wash.) and Christopher Ramsayer (Tualatin, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing system includes an upper electrode and a lower electrode arranged in a processing chamber. A gas delivery system is configured to selectively deliver at least one of a precursor gas, one or more deposition carrier gases, and a post deposition purge gas. An RF generating system is configured to deposit film on a s...