US Patent Issued to Lam Research on Feb. 4 for "RF tuning systems including tuning circuits having impedances for setting and adjusting parameters of electrodes in electrostatic chucks" (Oregon, California, Florida Inventors)

ALEXANDRIA, Va., Feb. 5 -- United States Patent no. 12,217,939, issued on Feb. 4, was assigned to Lam Research Corp. (Fremont, Calif.).

"RF tuning systems including tuning circuits having impedances for setting and adjusting parameters of electrodes in electrostatic chucks" was invented by David French (Fort Myers, Fla.), Vincent E. Burkhart (Cupertino, Calif.), Karl Frederick Leeser (West Linn, Ore.) and Liang Meng (Sherwood, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing system for processing a substrate within a processing chamber is provided and includes a source terminal, a substrate support, and a tuning circuit. The substrate support holds the substrate and includes first a...