US Patent Issued to Lam Research on Dec. 23 for "Cyclic development of metal oxide based photoresist for etch stop deterrence" (California Inventors)

ALEXANDRIA, Va., Dec. 23 -- United States Patent no. 12,504,692, issued on Dec. 23, was assigned to Lam Research Corp. (Fremont, Calif.).

"Cyclic development of metal oxide based photoresist for etch stop deterrence" was invented by Da Li (Newark, Calif.), Ji Yeon Kim (Fremont, Calif.), Samantha S.H. Tan (Newark, Calif.) and Timothy William Weidman (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are processes for development of photopatterned metal or metal oxide-based thin film photoresists post-EUV exposure for removal of non-volatile species and deterring etch stop. Repeated cycles of alternating treatment with an etchant and an oxidizing agent; or treatment with an etchant foll...