US Patent Issued to Lam Research on April 15 for "Multiple state pulsing for high aspect ratio etch" (California Inventors)

ALEXANDRIA, Va., June 5 -- United States Patent no. 12,278,112, issued on April 15, was assigned to Lam Research Corp. (Fremont, Calif.).

"Multiple state pulsing for high aspect ratio etch" was invented by Aniruddha Joi (Milpitas, Calif.), Nikhil Dole (Castro Valley, Calif.), Merrett Wong (San Carlos, Calif.), Eric Hudson (Berkeley, Calif.) and Jay Sheth (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for performing an etch process on a substrate includes applying a bias signal and a source signal to an electrode of a plasma processing system. The bias signal and the source signal are pulsed RF signals that together define a repeated pulsed RF cycle, wherein each pulsed RF cycle seq...