US Patent Issued to L3HARRIS TECHNOLOGIES on Oct. 7 for "Substrate stack epitaxies for photocathodes for extended wavelengths" (Arizona Inventors)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,437,954, issued on Oct. 7, was assigned to L3HARRIS TECHNOLOGIES INC. (Melbourne, Fla.).

"Substrate stack epitaxies for photocathodes for extended wavelengths" was invented by Bed Pantha (Chandler, Ariz.), Jacob J. Becker (Gilbert, Ariz.) and Jon D. Burnsed (Tempe, Ariz.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photocathode epitaxial structure. The photocathode epitaxial structure includes an improved substrate stack. The improved substrate stack includes a GaAs substrate and one or more additional layers formed on the GaAs substrate. The one or more additional layers are configured to provide an improved substrate stack surface with predetermine...