US Patent Issued to L'Air Liquide Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude on May 27 for "Step coverage using an inhibitor molecule for high aspect ratio structures" (South Korean Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,312,677, issued on May 27, was assigned to L'Air Liquide Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude (Paris).

"Step coverage using an inhibitor molecule for high aspect ratio structures" was invented by Wontae Noh (Seoul, South Korea) and Jooho Lee (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a method for improving step coverage of a film deposited on high aspect ratio (HAR) apertures in a substrate. The method comprises i) sequentially or simultaneously exposing the substrate to a vapor of an inhibitor, a vapor of a precursor and a vapor of a co-reactant; and ii) allowing the film with a...