US Patent Issued to KYUNGPOOK NATIONAL UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION on Sept. 23 for "Method of manufacturing self-adhesive polyurethane substrates via selective photo-polymerization" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,421,433, issued on Sept. 23, was assigned to KYUNGPOOK NATIONAL UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION (Daegu, South Korea).

"Method of manufacturing self-adhesive polyurethane substrates via selective photo-polymerization" was invented by Junyeob Yeo (Daegu, South Korea), Taeseung Hwang (Daegu, South Korea) and Hee Jin Lee (Daegu, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a method of manufacturing self-adhesive polyurethanes using selective photo-polymerization. The method of manufacturing self-adhesive polyurethanes using photo-polymerization relates to a method for manufacturing photo-polymerized self-adhesi...