US Patent Issued to KYOTO UNIVERSITY on March 25 for "Structured nanoporous materials, manufacture of structured nanoporous materials and applications of structured nanoporous materials" (Japanese Inventors)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,259,650, issued on March 25, was assigned to KYOTO UNIVERSITY (Kyoto, Japan).

"Structured nanoporous materials, manufacture of structured nanoporous materials and applications of structured nanoporous materials" was invented by Easan Sivaniah (Kyoto, Japan), Masateru Ito (Kyoto, Japan) and Daisuke Yamamoto (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method is disclosed for manufacturing a structured polymeric material. In the method, a body is provided comprising a substantially homogenous precursor polymeric material. An interference pattern of electromagnetic radiation is set up within the body to form a partially cross-linked poly...