ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,456,640, issued on Oct. 28, was assigned to KYOCERA Corp. (Kyoto, Japan).
"Electrostatic chuck" was invented by Wataru Fujita (Higashiomi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An electrostatic chuck according to the present disclosure includes a plate-shaped body including an adsorption surface for mounting a workpiece, a base, and an electrode film located between the plate-shaped body and the base. The plate-shaped body and the base are made of sapphire. The angle between the adsorption surface and the c-plane of the sapphire is 45deg or more."
The patent was filed on Jan. 25, 2022, under Application No. 18/274,834.
*For further info...