ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,451,338, issued on Oct. 21, was assigned to KYOCERA Corp. (Kyoto, Japan).
"Plasma treatment apparatus member" was invented by Daiki Watanabe (Satsumasendai, Japan), Miki Hamada (Satsumasendai, Japan) and Yuusaku Ishimine (Satsumasendai, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma treatment apparatus member according to the present disclosure includes a base, a plasma electrode, a heating element, and a conductive layer. The base is made of a ceramic and has a facing surface facing an object to be processed. The plasma electrode is located inside the base. The heating element and the conductive layer are located farther from the facing ...