US Patent Issued to KYOCERA on June 3 for "Member for use in plasma processing device, and plasma processing device provided therewith" (Japanese Inventors)

ALEXANDRIA, Va., June 4 -- United States Patent no. 12,322,576, issued on June 3, was assigned to KYOCERA Corp. (Kyoto, Japan).

"Member for use in plasma processing device, and plasma processing device provided therewith" was invented by Kazuhiro Ishikawa (Shiga, Japan), Takashi Hino (Yokohama, Japan) and Shuichi Saito (Yokohama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A member for use in a plasma processing device of the disclosure includes a base material and a film containing yttrium oxide as a main component on the base material. An area occupancy of closed pores of the film is 0.2 area % or less, and a full width at half maximum of a diffraction peak on a (222) plane of yttrium oxide obtain...