US Patent Issued to KYOCERA on April 22 for "Member for use in plasma processing device, and plasma processing device provided therewith" (Japanese Inventors)

ALEXANDRIA, Va., June 6 -- United States Patent no. 12,283,466, issued on April 22, was assigned to KYOCERA Corp. (Kyoto, Japan).

"Member for use in plasma processing device, and plasma processing device provided therewith" was invented by Kazuhiro Ishikawa (Shiga, Japan), Takashi Hino (Kanagawa, Japan) and Shuichi Saito (Kanagawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A member for use in a plasma processing device of the disclosure includes a base material, and a film of an oxide of a rare earth element on at least a part of the base material. A coefficient of variation of thickness of the film is 0.04 or less. A plasma processing device of the disclosure includes the member for use in a plas...