US Patent Issued to Kwansei Gakuin Educational Foundation, SK Materials JNC on Nov. 18 for "Polycyclic aromatic compound" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,473,315, issued on Nov. 18, was assigned to Kwansei Gakuin Educational Foundation (Hyogo, Japan) and SK Materials JNC Co. Ltd. (Gyeonggi-do, South Korea).

"Polycyclic aromatic compound" was invented by Takuji Hatakeyama (Hyogo, Japan), Soichiro Nakatsuka (Hyogo, Japan), Kiichi Nakajima (Hyogo, Japan), Hiroki Hirai (Hyogo, Japan), Yohei Ono (Chiba, Japan), Kazushi Shiren (Chiba, Japan), Jingping Ni (Chiba, Japan), Takeshi Matsushita (Chiba, Japan) and Toshiaki Ikuta (Chiba, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A novel polycyclic aromatic compound in which plural aromatic rings are linked via boron atoms, oxygen atoms and the like is provi...