US Patent Issued to KURARAY on March 18 for "Polyurethane for polishing layers, polishing layer and polishing pad" (Japanese Inventors)

ALEXANDRIA, Va., March 19 -- United States Patent no. 12,252,634, issued on March 18, was assigned to KURARAY Co. LTD. (Kurashiki, Japan).

"Polyurethane for polishing layers, polishing layer and polishing pad" was invented by Mitsuru Kato (Kurashiki, Japan), Chihiro Okamoto (Kurashiki, Japan) and Shinya Kato (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are a polyurethane for use in a polishing layer, and a polishing layer and a polishing pad using the same, the polyurethane including a terminal group represented by the following formula (I): R-(OX)n- (I) wherein R represents a monovalent hydrocarbon group having 1 to 30 carbon atoms that may be substituted with a heteroatom or may be inter...