ALEXANDRIA, Va., June 6 -- United States Patent no. 12,281,378, issued on April 22, was assigned to KunShan Go-Visionox Opto-Electronics Co. Ltd. (Kunshan, China).
"Mask" was invented by Lin Sun (Jiangsu, China), Jingjing Zhao (Jiangsu, China) and Mingxing Liu (Jiangsu, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "A mask includes an opening area and a shelter area adjacent to the opening area, the opening area includes an opening pattern, the shelter area includes a buffer pattern adapted to the opening pattern. This application achieves a purpose that a sudden change of stress at a boundary between the opening area and the shelter area is buffered, thereby ensuring that the pull of the mesh as it op...