US Patent Issued to KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY on March 18 for "Perspiration mapping patch" (South Korean Inventors)

ALEXANDRIA, Va., March 19 -- United States Patent no. 12,251,235, issued on March 18, was assigned to KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (Seoul, South Korea).

"Perspiration mapping patch" was invented by Hyunjung Yi (Seoul, South Korea), Seongjin Park (Seoul, South Korea) and Wonseop Hwang (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A perspiration mapping patch according to the present disclosure is attached to skin of a user to absorb sweat, and includes: a sweat absorbing layer in which a plurality of opening units is arranged; a first support layer which is stacked on a first surface of the sweat absorbing layer and includes an opening opened to correspond to each of the plur...