US Patent Issued to Korea Institute of Science and Technology on April 15 for "UV- and heat-curable ladder-like polysilsesquioxane copolymer, insulation composition containing same and method for forming microcircuit pattern using same" (South Korean Inventors)

ALEXANDRIA, Va., June 5 -- United States Patent no. 12,276,912, issued on April 15, was assigned to Korea Institute of Science and Technology (Seoul, South Korea).

"UV- and heat-curable ladder-like polysilsesquioxane copolymer, insulation composition containing same and method for forming microcircuit pattern using same" was invented by Seung Sang Hwang (Seoul, South Korea), Soon Man Hong (Seoul, South Korea), Kyung Youl Baek (Seoul, South Korea), Chong Min Koo (Seoul, South Korea), Albert Lee (Seoul, South Korea), Seon Joon Kim (Seoul, South Korea) and You Mee Choi (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to a UV- and heat-curable ladder-like polysils...