US Patent Issued to KOREA INSTITUTE OF MATERIALS SCIENCE on Dec. 9 for "Plasma etching apparatus component for manufacturing semiconductor comprising composite sintered body and manufacturing method therefor" (South Korean Inventors)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,494,373, issued on Dec. 9, was assigned to KOREA INSTITUTE OF MATERIALS SCIENCE (Changwon-si, South Korea).

"Plasma etching apparatus component for manufacturing semiconductor comprising composite sintered body and manufacturing method therefor" was invented by Young Jo Park (Changwon-si, South Korea), Ha Neul Kim (Changwon-si, South Korea), Jae Woong Ko (Changwon-si, South Korea), Mi Ju Kim (Gimhae-si, South Korea) and Hyeon Myeong Oh (Changwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a method of using a plasma etching apparatus in semiconductor manufacturing, the method including using a plasma etching apparatus in sem...