US Patent Issued to Korea Institute of Civil Engineering and Building Technology on Jan. 28 for "Low-profile barrier and constructing method thereof" (South Korean Inventors)

ALEXANDRIA, Va., Jan. 29 -- United States Patent no. 12,209,371, issued on Jan. 28, was assigned to Korea Institute of Civil Engineering and Building Technology (Goyang-si, South Korea).

"Low-profile barrier and constructing method thereof" was invented by Jung-Gon Sung (Goyang-si, South Korea), Min Hyung No (Cheonan-si, South Korea), Duk-Geun Yun (Goyang-si, South Korea), Young Rok Kim (Goyang-si, South Korea), Chunjoo Yoon (Seoul, South Korea) and Jaehong Park (Goyang-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to a low-profile barrier including a plurality of segments continuously arranged in the longitudinal direction and a connecting member installed in ...