ALEXANDRIA, Va., June 4 -- United States Patent no. 12,321,092, issued on June 3, was assigned to Korea Electronics Technology Institute (Seongnam-si, South Korea).
"Pellicle for extreme ultraviolet lithography containing amorphous carbon and method for manufacturing the same" was invented by Hyeong Keun Kim (Yongin-si, South Korea), Seul Gi Kim (Yongin-si, South Korea), Hyun Mi Kim (Seoul, South Korea), Jin Woo Cho (Seoul, South Korea) and Hye Young Kim (Bucheon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "This application relates to a pellicle for extreme ultraviolet lithography containing amorphous carbon and a manufacturing method thereof. In one aspect, the pellicle includes a substrat...