US Patent Issued to KOREA ELECTRONICS TECHNOLOGY INSTITUTE on June 10 for "Pellicle for extreme ultraviolet lithography containing molybdenum carbide" (South Korean Inventors)

ALEXANDRIA, Va., June 18 -- United States Patent no. 12,326,658, issued on June 10, was assigned to KOREA ELECTRONICS TECHNOLOGY INSTITUTE (Seongnam-si, South Korea).

"Pellicle for extreme ultraviolet lithography containing molybdenum carbide" was invented by Hyeong Keun Kim (Yongin-si, South Korea), Seul Gi Kim (Yongin-si, South Korea), Hyun Mi Kim (Seoul, South Korea), Jin Woo Cho (Seoul, South Korea) and Yong Kyung Kim (Gwangju-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A pellicle for extreme ultraviolet lithography containing molybdenum carbide is disclosed. The pellicle includes a substrate having an opening formed in a central portion, and a pellicle layer formed on the substrate to...