US Patent Issued to Korea Electronics Technology Institute on Aug. 5 for "Pellicle for extreme ultraviolet lithography" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,379,654, issued on Aug. 5, was assigned to Korea Electronics Technology Institute (Seongnam-si, South Korea).

"Pellicle for extreme ultraviolet lithography" was invented by Hyeong Keun Kim (Yongin-si, South Korea), Seul Gi Kim (Yongin-si, South Korea), Hyun Mi Kim (Seoul, South Korea), Jin Woo Cho (Seoul, South Korea) and Ki Hun Seong (Anyang-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "This application relates to a pellicle for extreme ultraviolet lithography used in a lithography process using extreme ultraviolet rays. In one aspect, the pellicle includes a pellicle layer formed of an M-Alpha material in which M is combined with Alpha...