US Patent Issued to KOREA ATOMIC ENERGY RESEARCH INSTITUTE on Dec. 16 for "Plasma uniformity control system using multi-pulsing and control method thereof" (South Korean Inventor)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,501,535, issued on Dec. 16, was assigned to KOREA ATOMIC ENERGY RESEARCH INSTITUTE (Daejeon, South Korea).

"Plasma uniformity control system using multi-pulsing and control method thereof" was invented by Sung Ryul Huh (Sejong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system for controlling plasma uniformity according to an embodiment includes a plasma generator configured to generate plasma by applying pulsed power to a plasma source gas, an ion supply unit connected to the plasma generator and configured to receive and accommodate the plasma generated by the plasma generator, a plurality of segmented electrodes positioned inside...