US Patent Issued to Korea Advanced Institute of Science and Technology on Dec. 16 for "Nucleic acid-mediated pattern replication and method of manufacturing 2-D material using the same" (South Korean Inventors)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,497,646, issued on Dec. 16, was assigned to Korea Advanced Institute of Science and Technology (Daejeon, South Korea).

"Nucleic acid-mediated pattern replication and method of manufacturing 2-D material using the same" was invented by Jae-Byum Chang (Daejeon, South Korea) and Jueun Sim (Daejeon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are the nucleic acid-mediated pattern replication and a method of manufacturing a 2-D material using the same. A method of manufacturing a 2-D material according to an embodiment may include preparing a first material having a first nucleic acid patterned on a surface thereof, bonding a linker-n...