US Patent Issued to Konica Minolta on April 15 for "Method for manufacturing optical lens provided with anti-reflection film" (Japanese Inventors)

ALEXANDRIA, Va., June 5 -- United States Patent no. 12,276,773, issued on April 15, was assigned to Konica Minolta Inc. (Tokyo).

"Method for manufacturing optical lens provided with anti-reflection film" was invented by Yoshihiro Nakano (Tondabaya, Japan) and Koji Takahara (Hirakata, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for manufacturing an optical lens using an ion-assisted deposition apparatus that comprises an ion source includes: forming, on a lens substrate made of a material containing 40 mass % or more of fluoride, a first lower layer of an anti-reflection film of the optical lens, wherein the first lower layer is a fluoride layer; forming, on the first lower layer, a second l...