US Patent Issued to Kokusai Electric on Oct. 7 for "Raw material supply system, substrate processing apparatus, and method of manufacturing semiconductor device" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,435,424, issued on Oct. 7, was assigned to Kokusai Electric Corp. (Tokyo).

"Raw material supply system, substrate processing apparatus, and method of manufacturing semiconductor device" was invented by Kaoru Yamamoto (Toyama, Japan) and Kentaro Goshima (Toyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a configuration that includes: a first gas supply line configured to be capable of controlling a flow rate of a first precursor gas, which is generated by a first raw material, by a flow rate controller, and supplying the first precursor gas into the process chamber; and a second gas supply line configured to be capable of supp...