US Patent Issued to KOKUSAI ELECTRIC on Nov. 4 for "Substrate processing apparatus, plasma light emitting apparatus and method of manufacturing semiconductor device" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,463,017, issued on Nov. 4, was assigned to KOKUSAI ELECTRIC Corp. (Tokyo).

"Substrate processing apparatus, plasma light emitting apparatus and method of manufacturing semiconductor device" was invented by Tsuyoshi Takeda (Toyama, Japan) and Daisuke Hara (Toyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "According to one aspect of the technique of the present disclosure, there is provided a substrate processing apparatus including: a process chamber in which a substrates is processed; and a plasma generator including: a first gas supply pipe through which a first gas is supplied; an application electrode to which a high frequency power is appl...