US Patent Issued to KOKUSAI ELECTRIC on May 6 for "Substrate processing apparatus, elevator and method of manufacturing semiconductor device" (Japanese Inventors)

ALEXANDRIA, Va., June 10 -- United States Patent no. 12,293,932, issued on May 6, was assigned to KOKUSAI ELECTRIC Corp. (Tokyo).

"Substrate processing apparatus, elevator and method of manufacturing semiconductor device" was invented by Yuji Takebayashi (Toyama, Japan), Makoto Hirano (Toyama, Japan), Koji Shibata (Toyama, Japan) and Yusaku Okajima (Toyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A technique for improving uniformity of film thickness on substrates, includes a substrate processing apparatus having a substrate retainer including substrate and partition plate supports; a reaction tube; a first driver vertically moving the substrate retainer into or out of the reaction tube; a secon...