ALEXANDRIA, Va., March 5 -- United States Patent no. 12,241,159, issued on March 4, was assigned to Kokusai Electric Corp. (Tokyo).
"Substrate processing apparatus and ceiling heater" was invented by Tetsuya Kosugi (Toyama, Japan), Hitoshi Murata (Toyama, Japan) and Shuhei Saido (Toyama, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "According to the technique of the present disclosure, there is provided a substrate processing apparatus including: a reaction tube accommodating therein a plurality of substrates vertically arranged; and a first heater configured to heat an inside of the reaction tube from an upper portion of the reaction tube, wherein a heat generating amount of the first heater in a reg...