US Patent Issued to Kokusai Electric on June 10 for "Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium" (Japanese Inventors)

ALEXANDRIA, Va., June 18 -- United States Patent no. 12,327,755, issued on June 10, was assigned to Kokusai Electric Corp. (Tokyo).

"Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium" was invented by Naofumi Ohashi (Toyama, Japan), Toshiyuki Kikuchi (Toyama, Japan) and Tadashi Takasaki (Toyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Some embodiments of the present disclosure provide a technique capable of reducing an amount of deposits on a back surface of a rotary table. According to one aspect thereof, there is provided a technique that includes: a process chamber provided with process regions; a rotary table con...