US Patent Issued to Kokusai Electric on July 8 for "Substrate processing apparatus, substrate processing method, method of manufacturing semiconductor device and non-transitory computer-readable recording medium" (Japanese Inventor)

ALEXANDRIA, Va., July 9 -- United States Patent no. 12,354,848, issued on July 8, was assigned to Kokusai Electric Corp. (Tokyo).

"Substrate processing apparatus, substrate processing method, method of manufacturing semiconductor device and non-transitory computer-readable recording medium" was invented by Yasunori Ejiri (Toyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "According to one aspect of the technique of the present disclosure, there is provided a substrate processing apparatus including: a process chamber; a process gas supplier through which a process gas is supplied into the process chamber; an exhauster through which an inner atmosphere of the process chamber is exhausted; a plasma g...