US Patent Issued to KOKUSAI ELECTRIC on Dec. 16 for "Gas supply structure and substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,497,696, issued on Dec. 16, was assigned to KOKUSAI ELECTRIC Corp. (Tokyo).

"Gas supply structure and substrate processing apparatus" was invented by Tomoyuki Kurata (Toyama, Japan), Shinya Morita (Toyama, Japan), Atsushi Hirano (Toyama, Japan), Satoru Murata (Toyama, Japan) and Hiromi Okada (Toyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A gas supply structure capable of suppressing damage to a structure provided in a reaction tube and made of the non-metallic material such as quartz includes: a gas supply nozzle through which a process gas is supplied into a process chamber in a reaction tube via an opening; a first seal provided so as t...