ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,399,288, issued on Aug. 26, was assigned to KOITO MANUFACTURING Co. LTD. (Tokyo).

"Manufacturing method of scintillator material and scintillator material" was invented by Hisayoshi Daicho (Shizuoka, Japan), Takeshi Iwasaki (Shizuoka, Japan) and Atsushi Nakamura (Shizuoka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of manufacturing a scintillator material includes providing a substrate made of a quartz glass and having a recess formed therein; filling the recess with a raw material powder obtained by mixing an iodide raw material and SiO2 fine particles; after filling the recess, disposing a lid on the substrate to cover the recess; a...