ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,444,155, issued on Oct. 14, was assigned to KLA Corp. (Milpitas, Calif.).
"Robust image-to-design alignment for dram" was invented by Hucheng Lee (Cupertino, Calif.) and Huan Jin (Dublin, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and systems for alignment for semiconductor applications are provided. One method includes determining different align-to-design offsets for multiple instances of an alignment target formed on a specimen by separately aligning images of the multiple instances of the alignment target generated by an imaging subsystem to a rendered image for the alignment target with different alignment methods, respectively. ...