US Patent Issued to KLA on Nov. 25 for "Optical and X-ray metrology methods for patterned semiconductor structures with randomness" (American, South Korean Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,480,893, issued on Nov. 25, was assigned to KLA Corp. (Milpitas, Calif.).

"Optical and X-ray metrology methods for patterned semiconductor structures with randomness" was invented by Daniel James Haxton (Fremont, Calif.), Christopher Liman (San Jose, Calif.), Inkyo Kim (Cupertino, Calif.), Boxue Chen (San Jose, Calif.), Hyowon Park (Milpitas, Calif.), Thaddeus Gerard Dziura (San Jose, Calif.), Nakyoon Kim (Hwaseong-si, South Korea), Houssam Chouaib (Milpitas, Calif.), Anderson Chou (Hillsboro, Ore.) and Dimitry Sanko (Vallejo, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and systems for determining random variation in one or more struct...