ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,484,316, issued on Nov. 25, was assigned to KLA Corp. (Milpitas, Calif.).

"CVD boron uniformity overcoming loading effects" was invented by Jehn-Huar Howard Chern (Morgan Hill, Calif.), Marcel Trimpl (San Jose, Calif.) and David L. Brown (Los Gatos, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The loading effects of boron layers on silicon within a window may be reduced or eliminated by depositing an adhesion layer on a dielectric layer before depositing the boron layer. The adhesion layer may reduce or eliminate lateral diffusion of boron species into the window by being deposited on the adhesion layer. The approach using the adhesion layer ma...