US Patent Issued to KLA on May 13 for "System and method for reducing sample noise using selective markers" (California, Illinois Inventors)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,298,254, issued on May 13, was assigned to KLA Corp. (Milpitas, Calif.).

"System and method for reducing sample noise using selective markers" was invented by Grace Hsiu-Ling Chen (Los Gatos, Calif.), Kuljit S. Virk (Fremont, Calif.) and Martin Gruebele (Champaign, Ill.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An inspection is disclosed. The system may include an illumination source configured to illuminate a sample. The sample may include a multi-layer stack including a plurality of layers formed of a first material and at least a second material. The first material may include a light transmissive material and the second material may include lig...