US Patent Issued to KLA on March 18 for "Scatterometry overlay metrology with orthogonal fine-pitch segmentation" (Israeli Inventors)

ALEXANDRIA, Va., March 19 -- United States Patent no. 12,253,805, issued on March 18, was assigned to KLA Corp. (Milpitas, Calif.).

"Scatterometry overlay metrology with orthogonal fine-pitch segmentation" was invented by Vladimir Levinski (Nazareth Ilit, Israel), Daria Negri (Nesher, Israel) and Amnon Manassen (Haifa, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "An overlay metrology target may include grating-over-grating structures formed from a lower grating structure with a first coarse pitch in a first sample layer and an upper grating structure with a second coarse pitch in a second sample layer, where the upper and lower grating structures overlap on the sample. At least one of the upper grat...