US Patent Issued to KLA on June 10 for "Oscillating secondary stage for frame-mode overlay metrology" (California Inventors)

ALEXANDRIA, Va., June 18 -- United States Patent no. 12,327,741, issued on June 10, was assigned to KLA Corp. (Milpitas, Calif.).

"Oscillating secondary stage for frame-mode overlay metrology" was invented by Izhar Agam (Milpitas, Calif.), Andrew Hill (Milpitas, Calif.), Yoram Uziel (Milpitas, Calif.), Amnon Manassen (Milpitas, Calif.) and Daria Negri (Milpitas, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An oscillating secondary stage in a metrology system. The metrology system includes a primary stage configured for long movement to transport a wafer from a one location to another. A secondary stage coupled to the primary stage holds the wafer is configured to oscillate between the first directio...