ALEXANDRIA, Va., July 30 -- United States Patent no. 12,373,936, issued on July 29, was assigned to KLA Corp. (Milpitas, Calif.).
"System and method for overlay metrology using a phase mask" was invented by Iftach Galon (Milpitas, Calif.), Itay Gdor (Tel-Aviv, Israel), Yuval Lubashevsky (Haifa, Israel), Yaniv Weiss (Milpitas, Calif.) and Nireekshan Reddy (Milpitas, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "An overlay metrology system is disclosed. The overlay metrology system may include a controller with one or more processors. The processors may be configured to execute program instructions causing the processors to receive pupil images of collected light from an overlay target and receive a kn...