ALEXANDRIA, Va., July 30 -- United States Patent no. 12,372,882, issued on July 29, was assigned to KLA Corp. (Milpitas, Calif.).

"Metrology in the presence of CMOS under array (CUA) structures utilizing an effective medium model with classification of CUA structures" was invented by Zhaxylyk Kudyshev (Milpitas, Calif.), Chao Chang (Milpitas, Calif.), Derrick A. Shaughnessy (San Jose, Calif.) and Houssam Chouaib (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system, may include a controller configured to cause the processors to implement a measurement recipe by: receiving optical measurement data for training samples after a first process step for fabricating complementary metal-oxide-sem...