US Patent Issued to KLA on July 15 for "Integration of an optical height sensor in mask inspection tools" (California Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,360,058, issued on July 15, was assigned to KLA Corp. (Milpitas, Calif.).

"Integration of an optical height sensor in mask inspection tools" was invented by Zefram Marks (Fremont, Calif.), Dmitry Skvortsov (San Jose, Calif.), Zhengyu Guo (Milpitas, Calif.), Zhengcheng Lin (San Jose, Calif.), Nicolas Steven Juliano (Milpitas, Calif.) and Rui-Fang Shi (Cupertino, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photomask-inspection system includes a vacuum chamber and a stage, disposed in the vacuum chamber, to support a photomask and to translate the photomask horizontally and vertically. The system also includes an EUV objective, disposed in the ...