US Patent Issued to KLA on July 1 for "Large-particle monitoring with laser power control for defect inspection" (California Inventors)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,345,658, issued on July 1, was assigned to KLA Corp. (Milpitas, Calif.).

"Large-particle monitoring with laser power control for defect inspection" was invented by Anatoly Romanovsky (Palo Alto, Calif.), Zhiwei Xu (Sunnyvale, Calif.), Yury Yuditsky (Mountain View, Calif.), Yifeng Cui (Fremont, Calif.) and Mandar Paranjape (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor wafer is inspected using a main laser beam and a secondary laser beam. The secondary laser beam leads the main laser beam and has lower power than the main laser beam. Using the secondary laser beam, a particle is detected on the semiconductor wafer having ...